26/08/07: Up to 70% of a semiconductor fab’s total water consumption is dedicated to the production of ultra-pure water. In the semiconductor industry, ultra-pure water (UPW) is used because even the smallest contamination can compromise the functionality of modern microchips. Today’s wafer structures are in the nanometer range—significantly smaller than bacteria, dust particles, or dissolved ions.

Ultra-pure water is used for rinsing and cleaning in almost every process step:
🔹Removes particles, chemical residues, and metal ions
🔹Leaves no residues behind
🔹Prevents defects and short circuits

A single particle can render an entire chip structure unusable. This is exactly where our customized ultra-pure water solutions come into play:
🔹We provide integrated systems for the generation, treatment, and distribution of ultra-pure water (UPW), specifically designed to meet the demanding requirements of semiconductor
manufacturing processes.
🔹By utilizing state-of-the-art technologies, we ensure that all critical quality parameters—such as particle count, TOC (Total Organic Carbon), conductivity, and microbiological purity—are
consistently maintained below the required limits.
🔹Our solutions are scalable, process-reliable, and designed for maximum system availability, enabling stable production processes and high yield rates.

With our technical expertise, industry-specific experience, and customer-focused engineering approach, we deliver ultra-pure water systems that meet both the current and future demands of the semiconductor industry.
👉 Contact us now for a personalized consultation.